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Table of Contents - Volume 483 - 1997 MRS Fall Meeting - Symposium E – Power Semiconductor Materials & Devices
Editors: S.J. Pearton, F. Ren, R.J. Shul, S. Tenconi, E. Wolfgang
G. T. Heydt and B. J. Skromme
Copyright © Materials Research Society 1998
DOI: http://dx.doi.org/10.1557/PROC-483-3 (About DOI)
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M. S. Shur
DOI: http://dx.doi.org/10.1557/PROC-483-15 (About DOI)
J. B. Casady, A. K. Agarwal, L. B. Rowland, S. Seshadri, R. R. Siergiej, S. S. Mani, D. C. Sheridan, P. A. Sanger and C. D. Brandt
DOI: http://dx.doi.org/10.1557/PROC-483-27 (About DOI)
A. Pirondi, G. Nicoletto, P. Cova, M. Pasqualetti, M. Portesine and P. E. Zani
DOI: http://dx.doi.org/10.1557/PROC-483-39 (About DOI)
M. Saggio, V. Raineri, F. Frisina and E. Rimini
DOI: http://dx.doi.org/10.1557/PROC-483-45 (About DOI)
J. L. Davidson, W. P. Kang, Y. Gurbuz, D. V. Kerns, L. Davis, K. Holmes, L. Jiang, Venkata Pulugurta, W. Anurat and M. Howell
DOI: http://dx.doi.org/10.1557/PROC-483-53 (About DOI)
Hui Jin Looi, Lisa Ys Pang and Richard B. Jackman
DOI: http://dx.doi.org/10.1557/PROC-483-63 (About DOI)
B. Ramaswami and K. Jagannadham
DOI: http://dx.doi.org/10.1557/PROC-483-69 (About DOI)
G. Gradinaru, N. C. Kao, J. Yang, Q. Chen, M. A. Khan and T. S. Sudarshan
DOI: http://dx.doi.org/10.1557/PROC-483-77 (About DOI)
J. C. Zolperw
DOI: http://dx.doi.org/10.1557/PROC-483-83 (About DOI)
T. P. Chow, N. Ramungul and M. Ghezzo
DOI: http://dx.doi.org/10.1557/PROC-483-89 (About DOI)
R. J. Shul, G. A. Vawter, C. G. Willison, M. M. Bridges, J. W. Lee, S. J. Pearton and C. R. Abernathy
DOI: http://dx.doi.org/10.1557/PROC-483-103 (About DOI)
C. E. Weitzel and K. E. Moore
DOI: http://dx.doi.org/10.1557/PROC-483-111 (About DOI)
I. Khlebnikov, T. S. Sudarshan, V. Madangarli and M. A. Capano
DOI: http://dx.doi.org/10.1557/PROC-483-123 (About DOI)
I. Khlebnikov, V. Madangarli and T. S. Sudarshan
DOI: http://dx.doi.org/10.1557/PROC-483-129 (About DOI)
Susumu Murakami, Hitoshi Matsuzaki, Mitsuyuki Matsuzaki, Masao Tsuruoka and Minoru Kanno
DOI: http://dx.doi.org/10.1557/PROC-483-135 (About DOI)
Andreas Plöbl, Heinz Stenzel, Qin-Yi Tong, Martin Langenkamp, Cord Schmidthals and Ulrich Gösele
DOI: http://dx.doi.org/10.1557/PROC-483-141 (About DOI)
L. Teng and W. A. Anderson
DOI: http://dx.doi.org/10.1557/PROC-483-147 (About DOI)
R. J. Shul, C. G. Willison, M. M. Bridges, J. Han, J. W. Lee, S. J. Pearton, C. R. Abernathy, J. D. MacKenzie and S. M. Donovan
DOI: http://dx.doi.org/10.1557/PROC-483-155 (About DOI)
C. D. Brandlel, F. Ren, R. G. Wilson, J. W. Lee, S. J. Pearton and J. M. Zavada
DOI: http://dx.doi.org/10.1557/PROC-483-163 (About DOI)
S. J. Pearton, C. R. Abernathy, J. D. MacKenzie, U. Hömmerich, J. M. Zavada, F. Rent, R. G. Wilson and R. N. Schwartz
DOI: http://dx.doi.org/10.1557/PROC-483-169 (About DOI)
J. J. Wang, E. S. Lambers, S. J. Pearton, M. Ostling, C.-M. Zetterling, J. M. Grow and F. Ren
DOI: http://dx.doi.org/10.1557/PROC-483-177 (About DOI)
F. Degas, G. Blondiaux and B. Pichaud
DOI: http://dx.doi.org/10.1557/PROC-483-185 (About DOI)
J. W. Lee, S. J. Pearton, C. R. Abernathy, G. A. Vawter, R. J. Shul, M. M. Bridges and C. G. Willison
DOI: http://dx.doi.org/10.1557/PROC-483-191 (About DOI)
W. A. Doolittle, A. Rohatgi, R. Ahrenkiel, D. Levi, G. Augustine and R. H. Hopkins
DOI: http://dx.doi.org/10.1557/PROC-483-197 (About DOI)
D. M. Wolfe, F. Wang, B. J. Hinds and G. Lucovsky
DOI: http://dx.doi.org/10.1557/PROC-483-203 (About DOI)
Zhangda Lin, Xiaosong Sun, Ge Yu and S. T. Lee
DOI: http://dx.doi.org/10.1557/PROC-483-209 (About DOI)
P. C. Yang, C. A. Wolden, W. Liu, R. Schlesser, R. F. Davis, J. T. Prater and Z. Sitar
DOI: http://dx.doi.org/10.1557/PROC-483-213 (About DOI)
Wen Ruimei and Pei Suhua
DOI: http://dx.doi.org/10.1557/PROC-483-219 (About DOI)
G. V. Gadiyak
DOI: http://dx.doi.org/10.1557/PROC-483-223 (About DOI)
H. Nienhaus and V. Van Elsbergen
DOI: http://dx.doi.org/10.1557/PROC-483-229 (About DOI)
V. Talyansky, R. D. Vispute, S. N. Andronescu, A. A. Iliadis, K. A. Jones, S. Choopun, M. J. Dowries, R. P. Sharma, T. Venkatesan, Y. X. Li, L. G Salamanca-Riba, M. C. Wood and R. A. Lareau
DOI: http://dx.doi.org/10.1557/PROC-483-235 (About DOI)
E. Martín, M. Chafai and J. Jiménez
DOI: http://dx.doi.org/10.1557/PROC-483-241 (About DOI)
S. Kerdiles, R. Rizk, A. Pérez-Rodríguez, B. Garrido, O. González-Varona, L. Calvo-Barrio and J.R. Morante
DOI: http://dx.doi.org/10.1557/PROC-483-247 (About DOI)
A. A. Iliadis, S. N. Andronescu, K. Edinger, J. H. Orloff, V. Talyansky, R. D. Vispute, R. P. Sharma, T. Venkatesan, M. C. Wood and K. A. Jones
DOI: http://dx.doi.org/10.1557/PROC-483-253 (About DOI)
Liang-Yu Chen, Gary W. Hunter, Philip G. Neudeck and Dak Knight
DOI: http://dx.doi.org/10.1557/PROC-483-259 (About DOI)
Hyun Cho, D. C. Hays, C. B. Vartuli, S. J. Pearton, C. R. Abemathy, J. D. MacKenzie, F. Ren and J. C. Zolper
DOI: http://dx.doi.org/10.1557/PROC-483-265 (About DOI)
J. R. Lothian and F. Ren
DOI: http://dx.doi.org/10.1557/PROC-483-271 (About DOI)
S. A. Ustin, C. Long, L. Lauhon and W. Ho
DOI: http://dx.doi.org/10.1557/PROC-483-279 (About DOI)
P. G. Neudeck, W. Huang and M. Dudley
DOI: http://dx.doi.org/10.1557/PROC-483-285 (About DOI)
V. D. Heydemann, E. K. Sanchez, G. S. Rohrer and M. Skowronski
DOI: http://dx.doi.org/10.1557/PROC-483-295 (About DOI)
D. Hofmann, R. Eckstein, L. Kadinski, M. Kölbl, M. Müller, St. G. Müller, E. Schmitt, A. Weber and A. Winnacker
DOI: http://dx.doi.org/10.1557/PROC-483-301 (About DOI)
S. Nishino, T. Yoshida and Y. Nishio
DOI: http://dx.doi.org/10.1557/PROC-483-307 (About DOI)
M. Sadeghi, A. Jauhiainen, B. Liss, E. Ö. Sveinbjörnsson and O. Engström
DOI: http://dx.doi.org/10.1557/PROC-483-315 (About DOI)
C Jacob, P Pirouz, H-I Kuo and M Mehregany
DOI: http://dx.doi.org/10.1557/PROC-483-321 (About DOI)
Hyun Cho, C. B. Vartuli, C. R. Abernathy, S. M. Donovan, S. J. Pearton, R. J. Shul and J. Han
DOI: http://dx.doi.org/10.1557/PROC-483-327 (About DOI)
H. Paul Maruska, Mike Lioubtchenko, Thomas G. Tetreault, Marek Osinskif, Stephen J. Pearton, Matthew Schurmant, Robert Vaudo, Shiro Sakap, Qisheng Chen and Randy J. Shult
DOI: http://dx.doi.org/10.1557/PROC-483-333 (About DOI)
M. Fu, V. Sarvepalli, R. K. Singh, C. R. Abernathy, X. Cao, S. J. Pearton and J. A. Sekhar
DOI: http://dx.doi.org/10.1557/PROC-483-345 (About DOI)
B. Fatemizadehl and Y. Granik
DOI: http://dx.doi.org/10.1557/PROC-483-357 (About DOI)
E. Stefanov, G. Charitat, N. Nolhier and Ph. Spiesser
DOI: http://dx.doi.org/10.1557/PROC-483-363 (About DOI)
R. Zehringer, A. Stuck and T. Lang
DOI: http://dx.doi.org/10.1557/PROC-483-369 (About DOI)
H.-J. Schulze and B.O. Kolbesen
DOI: http://dx.doi.org/10.1557/PROC-483-381 (About DOI)
E. Stefanov, G. Charitat, L. Bailon and J. Barbolla
DOI: http://dx.doi.org/10.1557/PROC-483-393 (About DOI)
Z. Z. Bandić, E.C. Piquette, P.M. Bridger, T.F. Kuech and T. C. Mcgill
DOI: http://dx.doi.org/10.1557/PROC-483-399 (About DOI)
R. Hickman, J. M. Van Hove, P. P. Chow, J. J. Klaassen, A. M. Wowchack and C. J. Polley
DOI: http://dx.doi.org/10.1557/PROC-483-405 (About DOI)
R.F. Kopf, R.A. Hamm, R.J. Malik, R.W. Ryan, J. Burm, A. Tate, Y-K. Chen, G. Georgiou, D.V. Lang, M. Geva and F. Ren
DOI: http://dx.doi.org/10.1557/PROC-483-413 (About DOI)
Yuichj Sasajima, Noboru Fukuhara, Masahiko Hata, Takayoshi Maeda and Hideyo Okushi
DOI: http://dx.doi.org/10.1557/PROC-483-425 (About DOI)
J.E. Yater, A. Shih and R. Abrams
DOI: http://dx.doi.org/10.1557/PROC-483-431 (About DOI)
M. L. O‘Brien, S. Pejdo and R. J. Nemanich
DOI: http://dx.doi.org/10.1557/PROC-483-437 (About DOI)
F. Ren, C. R. Abernathy, J. D. MacKenzie, B. P. Gila, S. J. Pearton, M. Hong, M. Macos, M. J. Schurman, A. G Baca and R. J. Shul
DOI: http://dx.doi.org/10.1557/PROC-483-443 (About DOI)